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Product > Mask Process > e beam Exposure
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In general,
high voltage in he range of 10 KeV is used to accelerate electrons in creating patterns on the blank mask surface. Recently, even higher voltage such as 50 KeV is used to create smaller geometries than previously.
There are two methods in creating patterns using e-beam: (1) raster scan and (2) vector scan. Raster scan involves back and forth motion of scanning, covering the entire mask surface, thus resulting in a lower throughput compared to vector scanning which traces only the area of patterns. Therefore, vector scanning method offers higher throughput compared to raster scanning method due to the reduced area coverage.
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