Heavy Organic, Metal
제거
H2SO4 + H2O2 -> H2SO5 + H2O
H2SO5 + Hydro Carbon -> CO2 + H2O
+ H2SO4
NH4OH
+ H2O2 + DIW
Organic, I/II족 Metal.Particle
제거
2H2O2 + C -> CO2 + 2H2O
M + H2O2 -> MO + H2O
MO + 4NH4OH -> M(NH4)4+
Vaporized IPA
1.
Surface Oxidation by H2O2
2.
Surface Etching and Particle Lift-off by NH4OH
3. Electrical Repulsion by Surface Charge
in Alkaline Solution (-OH) -The particles are separated and repelled from the mask surface simultaneously under the SC1 solution.
The interfacial surface tension force that causes
particle removal is very powerful and maintains
its strength proportionately as particle size decrease
Force
Relationships
Vander Waal’s ~ r
Interfacial
Surface ~ r
Tension
Spraying ~ r2
Spinning ~ r3
