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Product > Mask Technology > OPC
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OPC patterns
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OPC target patterns
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Merit
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Demerit
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Target Layers
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SB (Assist Bar)
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line width hole
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accurate correction
large DOF
enhancement
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Difficult mask
making
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gate
metal
contact
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Bias
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line width hole
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simple
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No accurate
correction
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gate
metal
contact
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Hammer head
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line-end hole
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simple
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No accurate
correction
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gate
metal
memory cell
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Serif
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line-end hole
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accurate correction
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Difficult mask
making
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contact
memory cell
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Jog
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line width
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accurate correction
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Difficult mask making
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metal
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| Optical Proximity Correction (OPC) Photomask is used to minimize the Optical Proximity Effect originated by the exposure equipment. Without using OPC, the actual pattern on the wafers would appear different from the design pattern. In order to minimize the optical proximity effect, pattern design is altered during the mask making process in order to achieve the desired pattern. As given below as an example, there are different kinds of OPC pattern for different target design pattern. |
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