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Dr. S.S.Choi
Director / R&D Center
Vice President
PhD. Physics |
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In May 1996, PKL Research Center was established in order to provide research and development for
photomask manufacturing and photomask equipment development. PKL R&D Center consists of 20% employees
of total headcount. In recent years, the R&D team has been focusing on developing new lithography
technologies in the fast changing areas such as TFT LCD and advanced semiconductor application.
As the semiconductor IC design requires increasingly smaller and smaller feature sizes, customers
are pushing photomask manufacturers to the physical limit of ultrahigh resolution patterns.
In order for PKL to meet the ever increasing customer demands for advanced Logic and DRAM chips,
we have to strive even harder to achieve advanced process technology.
As a result of our focus on the new technology development, PKL has accomplished significant
achievements in the following areas: New PSM & MPG lithography process development and Dry
Etch process enhancement. List below are some of the recent achievements PKL R&D team has achieved.
| Significant Achievements |
- ICP dry etcher development
- Mask cleaner development
- 45/32§ technology development
- DUV PSM process development
- Half-tone PSM development
- 28/22§ technology development
- FPD Slit Mask, HTM(Half tone)Mask development
- Wide Angle Viewing LCD Mask development
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