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Product > R&D > Patents
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Untitled Document
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Application Area
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Atomic
layer deposition apparatus for depositing
atomic layer on multiple substrates |
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Section
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Registration
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IPC Classification
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Patent(U.S.A) |
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Patent Application Number
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6,042,652
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Filing Date
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2000/03/28 |
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Registration Number
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6,042,652
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Announcement Date
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Applicant
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PKL |
Registration Date
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1999/09/07 |
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Inventor
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Hyun Kwang Soo / Park Kyung Ho / Yoon Neung Koo / Choi Kang Jun / Jeong Soo Hong |
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Application Area
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Atomic
layer deposition apparatus for depositing
multi substrate |
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Section
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Application
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IPC Classification
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Patent(Japan) |
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Patent Application Number
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(Japan) 2000-319772
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Filing Date
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1999-09-22 |
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Registration Number
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(Japan) 11-268198
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Announcement Date
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Applicant
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PKL |
Registration Date
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1999-09-22 |
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Inventor
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Hyun Kwang Soo / Park Kyung Ho / Yoon Neung Koo / Choi Kang Jun / Jeong Soo Hong |
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Application Area
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Dry
etching apparatus |
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Section
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Open to public
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IPC Classification
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Patent(Japan) |
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Patent Application Number
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Open to public
(Japan) : 2002-43278
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Filing Date
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2000-11-20 |
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Registration Number
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2000-352637
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Announcement Date
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Applicant
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PKL |
Registration Date
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2000-11-20 |
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Inventor
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Oh Kwang Sik / Jang Byung Soo / Kwon Hyuk Joo / Choi Boo Yeon / Park Kyung Ho / Jeong Soo Hong / Bae Nam Jin
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Application Area
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Apparatus
for etching mask |
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Section
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Application
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IPC Classification
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Patent(U.S.A) |
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Patent Application Number
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Filing Date
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2000-11-08 |
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Registration Number
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Announcement Date
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Applicant
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PKL |
Registration Date
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2000-11-08 |
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Inventor
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Oh Kwang Sik / Jang Byung Soo / Kwon Hyuk Joo / Choi Boo Yeon / Park Kyung Ho / Jeong Soo Hong / Bae Nam Jin
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